Alkaline Pre-Cleaner for DWS Solar Wafers

Core Technical Advantages

1. Rapid Contaminant Stripping

Powered by an advanced surfactant system, it quickly dissolves stubborn ingot bonding adhesives and breaks down the high-viscosity cooling fluids used in high-speed DWS cutting, enabling higher production throughput.

2. Unmatched Line Stability & Nozzle Protection

Effectively suspends silicon powder to prevent sedimentation and redeposition. This completely eliminates nozzle blockage, reducing unplanned maintenance frequency by up to 30%.

3. Fluoride-Free Equipment & Wastewater Compliance

The non-corrosive, fluoride-free formulation protects stainless steel tanks and internal piping, extending the service life of automated cleaning tools while significantly simplifying wastewater pre-treatment.

4. Cost-Efficient Bath Longevity

Maintains consistent cleaning performance for an extended bath life of 15-25 days. With routine replenishment of only 0.5%-1.0% stock solution, it drastically lowers chemical consumption and the total cost of ownership (TCO).

5. Ultra-Thin & Large-Format Support

The mild, controlled formulation prevents micro-cracks and surface damage on fragile, ultra-thin substrates (<150μm) during high-throughput cleaning of large-format solar wafers.

Technical Specifications of SPC-201A Alkaline Pre-Cleaner

Application Scenarios & System Integration

1. Standalone Application

SPC-201A can be used independently for processes that do not require a complete two-step cleaning system.

• PV Wafer Post-Slicing Rough Cleaning: Removes heavy organic contaminants and bulk silicon powder from as-cut wafers, ideal for customers who use third-party fine cleaning chemicals or have lower surface quality requirements.

• Used PV Wafer Recycling: Cost-effectively strips residual coatings and contaminants from end-of-life solar wafers, improving recycling efficiency and reducing material waste.

• Pre-Cleaning for Wafer Inspection: Prepares wafer surfaces for visual and electrical inspection by removing surface debris, ensuring accurate defect detection.

2. Two-Step System Integration

Recommended as the primary pre-cleaning step before the texturing process.

• Standard Two-Step PV Wafer Cleaning System: When followed by SPC-201B Weak Acid Fine Cleaner, delivers complete contaminant removal and optimal surface preparation for texturing, resulting in 0.3-0.5% higher solar cell conversion efficiency.

Usage Guidelines & FAQs

Recommended Operation Guide

• Dilution Ratio: 1:10 – 1:15 (approx. 6% – 10% concentration)

• Operating Temperature: 35 – 55℃ (Recommended: 45℃)

• Cleaning Method: Ultrasonic / Spray / Immersion

• Cleaning Time: 4 – 8 minutes

• Rinsing: Overflow rinsing with Grade 2 or above DI water

• Drying: Spin drying or low-temperature drying (< 80℃)

Note for standalone use: SPC-201A is suitable for rough cleaning and inspection pre-cleaning. For texturing preparation, we recommend following with a fine cleaning step to remove residual trace metals.

Frequently Asked Questions (FAQs)

Q1: What contaminants does SPC-201A remove?

A1: SPC-201A is specifically formulated to remove heavy slicing contaminants including Ingot bonding adhesives, diamond wire coolants, machining oils and bulk silicon powder particles.

Q2: Is SPC-201A safe for 182mm/210mm and beyond thin PV wafers?

A2: Yes, its mild non-corrosive formula prevents edge chipping and breakage of 130-180μm thin monocrystalline and polycrystalline photovoltaic silicon wafers.

Q3: Can SPC-201A be used alone?

A3: Yes, SPC-201A can be used alone for rough cleaning, wafer recycling and inspection pre-cleaning. For optimal texturing results, we recommend following with a fine cleaning step.

Q4: What is the recommended dilution ratio and operating temperature?

A4: The recommended dilution ratio is 1:10–1:15, and the optimal operating temperature is 35–55℃ (45℃ recommended for best results).

Q5: Can SPC-201A be used in high-volume production lines in Southeast Asia?

A5: Yes, its low-foaming formulation and long bath stability make it ideal for continuous high-volume automated production lines.

Q6: How long does the SPC-201A bath last?

A6: Under continuous production conditions, the bath typically lasts 15–25 days. Routine replenishment of 0.5%–1.0% stock solution every 8 hours maintains optimal performance.