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2214AC
2214AC Eco-Friendly Efficient Semiconductor Wafer Wax Remover is an environmentally friendly and highly efficient wax removal and cleaning product, formulated with unique and high-quality surfactants through scientific methods. It features rapid, convenient and quick wax removal, long-lasting effect, good water washing performance, low volatility and non-flammability. It has a long cleaning life. It has no corrosive effect on semiconductor materials, optical materials, etc. themselves, has good self-stability, and remains unchanged during long-term storage.
2214AC Eco-Friendly Efficient Semiconductor Wafer Wax Remover is an environmentally friendly and highly efficient wax removal and cleaning product, formulated with unique and high-quality surfactants through scientific methods. It features rapid, convenient and quick wax removal, long-lasting effect, good water washing performance, low volatility and non-flammability. It has a long cleaning life. It has no corrosive effect on semiconductor materials, optical materials, etc. themselves, has good self-stability, and remains unchanged during long-term storage.
a) Environmental-safe
Free of heavy metals/phosphorus and other harmful substances, fully biodegradable, protecting the environment and workers' health.
b) Efficient cleaning
It can strongly dissolve resins and adhesives, and has a remarkable cleaning effect.
c) Thermal Stability
The boiling point is as high as 200℃, and there is a slight odor during use.
d) Economical non-damaging
Low cost, does not corrode materials and maintains surface luster.
a) Environmental-safe
Free of heavy metals/phosphorus and other harmful substances, fully biodegradable, protecting the environment and workers' health.
b) Efficient cleaning
It can strongly dissolve resins and adhesives, and has a remarkable cleaning effect.
c) Thermal Stability
The boiling point is as high as 200℃, and there is a slight odor during use.
d) Economical non-damaging
Low cost, does not corrode materials and maintains surface luster.
Characteristics | Unit | Data |
Appearance(Original liquid) | - | Transparent liquid |
Appearance(Diluted solution) | - | Transparent liquid |
Odor | - | Slightly |
Pour Point | ℃ | 1 |
Density | kg/m³.15℃ | 0.95 |
pH Value | - | 6.5±0.5 |
Characteristics | Unit | Data |
Appearance(Original liquid) | - | Transparent liquid |
Appearance(Diluted solution) | - | Transparent liquid |
Odor | - | Slightly |
Pour Point | ℃ | 1 |
Density | kg/m³.15℃ | 0.95 |
pH Value | - | 6.5±0.5 |
a) Semiconductor industry and optoelectronic industry
Specially designed for wafer manufacturing and can efficiently remove wax residues from metal bonding processes, ensuring that the surface is free from contamination. Its low-corrosiveness formula is compatible with materials such as copper and aluminum, meeting the purity requirements of advanced manufacturing processes.
b) LED chip manufacturing
For the cleaning of polishing wax after the back thinning of LED chips, it can quickly dissolve the wax layer without damaging the GaN/SiC substrate.
c) Optical and electronic materials
It is suitable for precise dewaxing of materials such as sapphire and silicon wafers, and is particularly good at dealing with complex wax residues in piezoelectric ceramics. The neutral PH value formula avoids surface oxidation or lattice damage of the material.
d) Processing of hard materials (Optical crystals /SIC polishing/ceramics, etc.)
In the post-processing of SiC wafer polishing, wax and colloid residues can be removed simultaneously. Its low volatility characteristic complies with the cleanroom standards for optical crystal production.
a) Semiconductor industry and optoelectronic industry
Specially designed for wafer manufacturing and can efficiently remove wax residues from metal bonding processes, ensuring that the surface is free from contamination. Its low-corrosiveness formula is compatible with materials such as copper and aluminum, meeting the purity requirements of advanced manufacturing processes.
b) LED chip manufacturing
For the cleaning of polishing wax after the back thinning of LED chips, it can quickly dissolve the wax layer without damaging the GaN/SiC substrate.
c) Optical and electronic materials
It is suitable for precise dewaxing of materials such as sapphire and silicon wafers, and is particularly good at dealing with complex wax residues in piezoelectric ceramics. The neutral PH value formula avoids surface oxidation or lattice damage of the material.
d) Processing of hard materials (Optical crystals /SIC polishing/ceramics, etc.)
In the post-processing of SiC wafer polishing, wax and colloid residues can be removed simultaneously. Its low volatility characteristic complies with the cleanroom standards for optical crystal production.
a) Pour the wax-removing cleaning solution into a clean container, heat it to the required cleaning temperature, and then perform ultrasonic/immersion cleaning.
b) Direct original liquid cleaning is carried out. The cleaning equipment can be heated to 50-75°C, and the cleaning agent can be recycled.
The content of the active ingredients in the wax removal cleaning solution will gradually decrease during use, and the wax removal effect will slow down. This product should be replaced or added regularly, and the specific dosage should be determined by the actual situation.
Add in small amounts multiple times according to the cleaning effect and production volume. Keep the concentration uniform and mix the original solution according to the cleaning effect.
The cleaning effect has significantly declined, with excessive accumulation of oil, dirt and impurities on the surface. When the working fluid ages, it is necessary to re-open the grooves.
c) Do not let this product come into contact with your eyes. If it accidentally splashes into your eyes, lift your eyelids and rinse thoroughly with running water or normal saline. Do not swallow this product. If swallowed accidentally, induce vomiting, keep at rest and seek medical attention promptly.
d) To prevent excessive degreasing of the skin, wear chemical-resistant gloves during operation.
e) The storage period is two years. It cannot be stored outdoors and protected from direct sunlight and rain.
f) The bucket lid of the unused wax remover must be tightened to prevent water and impurities from mixing in.
a) Pour the wax-removing cleaning solution into a clean container, heat it to the required cleaning temperature, and then perform ultrasonic/immersion cleaning.
b) Direct original liquid cleaning is carried out. The cleaning equipment can be heated to 50-75°C, and the cleaning agent can be recycled.
The content of the active ingredients in the wax removal cleaning solution will gradually decrease during use, and the wax removal effect will slow down. This product should be replaced or added regularly, and the specific dosage should be determined by the actual situation.
Add in small amounts multiple times according to the cleaning effect and production volume. Keep the concentration uniform and mix the original solution according to the cleaning effect.
The cleaning effect has significantly declined, with excessive accumulation of oil, dirt and impurities on the surface. When the working fluid ages, it is necessary to re-open the grooves.
c) Do not let this product come into contact with your eyes. If it accidentally splashes into your eyes, lift your eyelids and rinse thoroughly with running water or normal saline. Do not swallow this product. If swallowed accidentally, induce vomiting, keep at rest and seek medical attention promptly.
d) To prevent excessive degreasing of the skin, wear chemical-resistant gloves during operation.
e) The storage period is two years. It cannot be stored outdoors and protected from direct sunlight and rain.
f) The bucket lid of the unused wax remover must be tightened to prevent water and impurities from mixing in.
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